Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III

Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III 1-2 March 1993, San Jose, California - Proceedings / SPIE--the International Society for Optical Engineering

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Book information

ISBN: 9780819411587
Publisher: The Society
Imprint: The Society
Pub date:
DEWEY: 621.381531
DEWEY edition: 20
Language: English
Number of pages: 470
Weight: -1g