X-Ray Microscopy II

X-Ray Microscopy II Proceedings of the International Symposium, Brookhaven, NY, August 31-September 4, 1987 - Springer Series in Optical Sciences

Softcover reprint of the original 1st Edition 1988

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Publisher's Synopsis

This volume is based on papers presented at the International Symposium on X-Ray Microscopy held at Brookhaven National Laboratory, Upton NY, August 31-September 4, 1987. Previous recent symposia on the sub- ject were held in New York in 1979, Gottingen in 1983 and Taipei in 1986. Developments in x-ray microscopy continue at a rapid pace, with im- portant advances in all major areas: x-ray sources, optics and components, and microscopes and imaging systems. Taken as a whole, the work pre- sented here emphasizes three major directions: (a) improvements in the capability and image-quality of x-ray microscopy, expressed principally in systems attached to large, high-brightness x-ray sources; (b) greater access to x-ray microscopy, expressed chiefly in systems employing small, often pulsed, x-ray sources; and (c) increased rate of exploration of applications of x-ray microscopy. The number of papers presented at the symposium has roughly dou- bled compared with that of its predecessors. While we are delighted at this growth as a manifestation of vitality and rapid growth of the field, we did have to ask the authors to limit the length of their papers and to submit them in camera-ready form. We thank the authors for their con- tributions and for their efforts in adhering to the guidelines on manuscript preparation.

Book information

ISBN: 9783662144909
Publisher: Springer Berlin Heidelberg
Imprint: Springer
Pub date:
Edition: Softcover reprint of the original 1st Edition 1988
Language: English
Number of pages: 455
Weight: 686g
Height: 229mm
Width: 152mm
Spine width: 24mm