Publisher's Synopsis
Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronic device fabrication. Until now, single chamber processing has been an elusive manufacturing objective throughout the histor of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realized and their potential has already innovated the industry.;The 14 papers in this volume cover topics such as: the background to this approach and up-dated status; design and concepts of relevant cluster tools equipment; specific process modules such as deposition chambers (CVD, RTCVD, UVCVD) annealing or etching reactors; and standardization efforts.;The work should provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
