Photomask Technology 2010

Photomask Technology 2010 13-16 September 2010, Monterey, California, United States - SPIE Proceedings Series

Paperback (30 Nov 2010)

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Publisher's Synopsis

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Book information

ISBN: 9780819483379
Publisher: SPIE
Imprint: SPIE
Pub date:
Language: English
Number of pages: 1026
Weight: -1g
Height: 229mm
Width: 152mm