Metrology, Inspection, and Process Control for Microlithography XXIII

Metrology, Inspection, and Process Control for Microlithography XXIII 23-26 February 2009, San Jose, California, United States - Proceedings of SPIE

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Publisher's Synopsis

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Book information

ISBN: 9780819475251
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381548
DEWEY edition: 22
Weight: -1g