Publisher's Synopsis
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented in a single volume to give a coherent presentation to all those interested or working in the field. ICB processes are well characterized and reliable equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
