Publisher's Synopsis
Ion implantation technology has made a major contribution to the advanced in integrated circuit technology since the early 1970s. The ever-present need for accurate models in ion implanted species will become vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. The implications for ion implantation technology, as well as additional observations of needs and opportunities are discussed. The volume should be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
