Publisher's Synopsis
Part A reviews the basic techniques of halide, organometallic and molecular beam epitaxy, liquid and solid phase epitaxial techniques, rapid solidification by pulsed laser annealing and laser ablation of oxide thin films. The final chapter is devoted to the growth of diamond films. Part B covers the underlying mechanisms and dynamics of epitaxial growth processes including nucleation, structural, kinetic and transport effects. In addition, refinements of some of the growth techniques described in Part A such as atomic layer, migration-enhanced and photo-assisted epitaxial processes are also described.
