Publisher's Synopsis
Discover the cutting-edge techniques driving the future of semiconductor manufacturing.
This comprehensive textbook offers an in-depth exploration of Extreme Ultraviolet (EUV) Lithography, the breakthrough technology overcoming the limitations of conventional optical lithography. Aimed at advanced students and professionals in the field, it delves into the fundamental principles, challenges, and applications of EUV lithography in modern device fabrication.
Key features include:
- In-depth Analysis of EUV Light Sources: Understand the generation of EUV radiation through laser-produced plasma sources, tackle challenges in achieving sufficient EUV power, and explore methods to enhance source brightness and stability.
- Advanced EUV Masks and Photoresists: Examine the design and fabrication of reflective EUV masks, absorber materials, and cutting-edge photoresist technologies addressing sensitivity, resolution, and line edge roughness control.
- Comprehensive Coverage of Process Control and Metrology: Learn about the latest metrology techniques essential for EUV lithography, including critical dimension measurements, overlay metrology, and strategies for managing stochastic effects and defects.
- Integration into Manufacturing Processes: Explore the challenges and strategies for integrating EUV lithography into existing semiconductor manufacturing, including infrastructure adaptations, process compatibility, and yield optimization.
- Applications in Logic and Memory Devices: Analyze the specific requirements and challenges of applying EUV lithography in fabricating advanced logic and memory devices, focusing on resolution, overlay demands, and pattern density.
