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Characterization of Plasma-Enhanced CVD Processes

Characterization of Plasma-Enhanced CVD Processes Symposium Held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A - Materials Research Society Symposium Proceedings

Hardback (05 Sep 1990)

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Publisher's Synopsis

Proceedings of the Boston symposium held Nov. 1989 on chemical vapor deposition. Topics include diagnostics and modelling, plasma enhanced CVD of silicon oxides and nitrides, semiconductors, novel materials. Acidic paper. Annotation copyright Book News, Inc. Portland, Or.

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Cambridge University Press

Cambridge University Press dates from 1534 and is part of the University of Cambridge. We further the University's mission by disseminating knowledge in the pursuit of education, learning and research at the highest international levels of excellence.

Book information

ISBN: 9781558990531
Publisher: Materials Research Society
Imprint: Cambridge University Press
Pub date:
DEWEY: 621.38152
DEWEY edition: 20
Language: English
Number of pages: 250
Weight: 1000g
Height: 231mm
Width: 152mm
Spine width: 23mm