Publisher's Synopsis
The themes of this volume are all concerned with structures on the microminiaturized scale. The first chapter on vacuum microelectronics is concerned with devices having tolerances in the nanometer range that rely on collision-free motion of electrons in a vacuum. This account of the subject covers emmission from conductors and from semiconductors, the fabricaton and properties of micro-field-emmission sources and the nature of a variety of vacuum micro-electronic devices. The second chapter is also concerned with electron-beam microlithography. Here the emphasis is on system design and the various ways of explaining the interaction between focusing and deflecting fields. The final chapter explains in detail two of the contrast mehanisms that contribute to the image in the most recent generation of low-voltage scanning electron microscopes. All three chapters deal with topics that are at the forefront of current technological development and offer authoritative accounts of subjects in rapid evolution.
