Publisher's Synopsis
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more devices have become a necessity for men for healthcare, a pleasant lifestyle, and to do tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors, etc. have been developed to meet the necessities of the people. All these devices have chips inside them fabricated using diodes, transistors, logic gates, and ICs. The patterning of the substrate which is used for the further development of these devices is done with the help of a technique known as Lithography. In the present work, we have done a review on different types of lithographic techniques like optical lithography, extreme ultraviolet lithography, electron beam lithography, x-ray lithography, and ion beam lithography. The evolutions made in these techniques with time and applications of these techniques in device fabrication are discussed. Different exposure tools developed in the last decade to enhance the resolution of the devices are also discussed. Chemically amplified and non-chemically amplified resists with their bonding and thickness are discussed.
