eBook (31 Dec 1988)
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Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
| ISBN: | 9780815516392 |
| Publisher: | Elsevier Science |
| Imprint: | William Andrew |
| Pub date: | 31 Dec 1988 |
| Language: | English |
| Number of pages: | 226 |
| Weight: | -1g |
| Height: | 229mm |
| Width: | 152mm |
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