Plasma Etching

Plasma Etching Fundamentals and Applications - Series on Semiconductor Science and Technology

Hardback (28 May 1998)

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Publisher's Synopsis

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Book information

ISBN: 9780198562870
Publisher: OUP OXFORD
Imprint: Oxford University Press
Pub date:
DEWEY: 621.381531
DEWEY edition: 21
Language: English
Number of pages: 347
Weight: 743g
Height: 242mm
Width: 163mm
Spine width: 23mm