5th International Symposium on Plasma Process-Induced Damage, 2000

5th International Symposium on Plasma Process-Induced Damage, 2000

Paperback (31 Jan 2001)

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Publisher's Synopsis

This text covers topics such as: CVD process damage effects; electron shading mechanism; front-end process damage effects; damage in multilevel interconnects; damage effects characterization; 300mm technology; thin dielectrics and degradation mechanisms and antenna test structures and design.

Book information

ISBN: 9780965157742
Publisher: I.E.E.E.Press
Imprint: I.E.E.E.Press
Pub date:
Language: English
Number of pages: 182
Weight: -1g
Height: 266mm
Width: 209mm
Spine width: 12mm