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1999 4th International Symposium on Plasma Process-Induced Damage

1999 4th International Symposium on Plasma Process-Induced Damage May 9-11, 1999, Monterey, California, USA

Hardback (30 Sep 1999)

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Publisher's Synopsis

This text constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.

Book information

ISBN: 9780965157735
Publisher: Northern California Chapter of the American Vacuum Society
Imprint: Northern California Chapter of the American Vacuum Society
Pub date:
DEWEY: 621.38152
DEWEY edition: 21
Language: English
Number of pages: 211
Weight: -1g
Height: 266mm
Width: 209mm
Spine width: 19mm